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Tantalum Carbide Coating Support
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Tantalum Carbide Coating Support

Pro professionalis Tantalum Carbide Coating Support producti opificem et officinam in Sinis, VeTek Semiconductor Tantalum Carbide Coating Support adhiberi solet pro superficiei structurarum partium structurarum seu subsidiorum componentium in instrumento semiconductoris, praesertim pro superficiali tutela instrumentorum clavium in semiconductoribus processuum fabricandis sicut CVD PVD. Excipe ulteriorem consultationem tuam.

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Praecipuum munus VeTek SemiconductorTantalum Carbide (TaC) CoatingSupport est ut ampliocalor resistentia, resistentia et corrosio resistentia geruntsubstratum iacuit Tantalum Carbide coating coating, ita ut accurationem et firmitatem processus emendare et vitam servitutis extendere videatur. Summus effectus est in agro processus semiconductoris coating usus.


VeTek Semiconductoris Tantalum Carbide Coating Supporem Mohs duritiem fere 9~10 habet, alterum solum adamantem. Maxime validum gerunt resistentiam et efficaciter potest resistere superficiei lapsum et ictum in dispensando, ita efficaciter extendendo ad ministerium vitae instrumentorum communicationis. Deducta cum summo liquamine punctum circiter 3880°C, saepe pro vestitu clavium instrumentorum semiconductoris adhibitum est, ut superficies tunicas structurarum subsidiorum, apparatum curationum caloris, cubicula vel gasketes in instrumento semiconductoris ad augendam suam resistentiam et caliditatem caliditatem. resistentia.


Ob altissimum punctum Tantali Carbide liquescens circa 3880°C, in processibus processus semiconductoris sicutvapor chemicus depositio (CVD)etvapor corporis depositio (PVD), TaC Coinging cum fortis caliditas resistentia et resistentia chemicae corrosionis resistentia potest efficaciter custodire instrumenta armorum et ne corrosio vel damnum substrati in extremis ambitibus, efficax praesidium praebet ad culturas caliditas laganum. Hoc pluma etiam determinat VeTek Semiconductoris Tantalum Carbide Coating Support saepe in processibus enormationibus et corrosivis adhibetur.


Tantalum Carbide Coating Support etiam munus habet minuendi particulam contagium. Per laganum processus, superficies vestis contaminationem particulatam plerumque producit, quae lagani qualitatem effecti afficit. TaC Coating ubertas extremae propensionis ad 9-10 duritia Mohs potest efficaciter hunc usum reducere, inde generationem particularum minuere. Conductus cum TaC Coating optima scelerisque conductivity (circiter 21 W/m·K), potest bonum scelerisque conductivity sub calidis condicionibus conservare, permagno meliore cede et constantia lagani vestibulum.


VeTek Semiconductor principalis TaC Coating products includitTaC Coating Heater, CVD TaC Coating Crucible, TaC Coating Rotatione SusceptoretTaC Coating Parce Part, etc . VeTek Semiconductor committitur ut optimas fructus et technicas solutiones pro semiconductoris industria praebeat. Sincere optamus nos participes facti tui diuturnitatis in Sinis.


Tantalum carbide (TaC) efficiens microscopic cross-sectioni:


Tantalum carbide (TaC) coating on a microscopic cross-section 1Tantalum carbide (TaC) coating on a microscopic cross-section 2Tantalum carbide (TaC) coating on a microscopic cross-section 3Tantalum carbide (TaC) coating on a microscopic cross-section 4


Basicae physicae proprietates CVD TaC coating


Corporalis proprietatibus TaC coating
Density
14.3 (g/cm³)
Imprimis emissivity
0.3
Scelerisque expansion coefficientes
6.3*10-6/K
Duritia (HK)
2000HK
Resistentia
1×10-5Ohm* cm
Scelerisque status
<2500℃
Graphite magnitudine mutationes
-10~-20um
Crassitudo coating
≥20um valorem typicum (35um±10um)

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