Home > Products > Tantalum Carbide Coating > Sic Epitaxy Processus > Tantalum Carbide Coated Cover
Tantalum Carbide Coated Cover
  • Tantalum Carbide Coated CoverTantalum Carbide Coated Cover

Tantalum Carbide Coated Cover

VeTek Semiconductor ducens Tantalum Carbide Coated Cover opificem et innovatorem in China. Specializati sumus in TaC et SiC per multos annos. Producta corrosio resistentia, altae vires habent. Expectamus ad longum tempus socium in Sinis fieri.

Mitte Inquisitionem

depictio producti


Ingens lectio Tantalum Carbide Coated Cover from China at VeTek Semiconductor invenies. Provide professionalem post venditiones operas et ius pretium, cooperationem exspecto. Tantalum Carbide Coated Cover evolvit a VeTek Semiconductor accessorium specie destinatum ad systema AIXTRON G10 MOCVD, ad optimize efficientiam intentans et semiconductor fabricandi qualitatem augendam. Adamussim conficitur utens materias qualitates et summa cum cura conficit, praestantes effectus et constantiam pro processibus metallico-organicis chemicis Vaporis Depositionis (MOCVD) procurans.


Tantalum Carbide (TaC), Tantalum Carbide Coated Cover offert eximiam thermarum stabilitatem, puritatem altam, et resistentiam ad temperaturas elevatas. Haec unica materiae coniunctio certam solutionem praebet ad condiciones operationales systematis MOCVD exigendas.


Tantalum Carbide Coated Cover est customizable ut varias magnitudinum lagani semiconductoris accommodet, eamque aptam ad diversas productiones requisita faciens. Eius constructio robusta est specie machinata ad resistendum environment provocans MOCVD, dum diuturna perficiendi et extenuando tempus et sustentationem gratuita cum lagano vehiculis et susceptoribus coniungitur.


Incorporando TaC operculum in systematis AIXTRON G10 MOCVD, semiconductoris artifices maiorem efficientiam et effectus superiores consequi possunt. Eximia scelerisque stabilitas, compatibilitas cum lagana diversarum magnitudinum, et certa Planetarii Orbis exsecutio pernecessarium efficit instrumentum ad efficientiam optimizing productionis et ad egregios exitus in MOCVD processu assequendos.



Product parametri Tantalum Carbide Coated Cover

Corporalis proprietatibus TaC coating
Density 14.3 (g/cm³)
Imprimis emissivity 0.3
Scelerisque expansion coefficientes 6.3 10-6/K
Duritia (HK) 2000 HK
Resistentia 1×10-5Ohm* cm
Scelerisque status <2500℃
Graphite magnitudine mutationes -10~-20um
Crassitudo coating ≥20um valorem typicum (35um±10um)


Azymum effectus post compositiones nostras utendo:

the Wafer performance after using our components


VeTek Semiconductor Production Shop:

Tantalum Carbide Coated Cover shops


Overview of the semiconductor chip epitaxy industry catena:


Hot Tags: Tantalum Carbide Coated Cover, China, Manufacturer, Supplier, Factory, Lorem, Eme, Provectus, Dura, Factus in Sinis
Related Categoria
Mitte Inquisitionem
Libenter placet, ut inquisitionem tuam in forma infra exhibeas. Respondebimus tibi in 24 horis.
X
We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
Reject Accept