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SiC Coating Susceptor
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SiC Coating Susceptor

Vetek Semiconductor spectat ad investigationem et progressionem et industrialem de CVD SiC coating et CVD TaC coating. Accipiens SiC coating susceptorem in exemplum, productum est valde processit cum magna praecisione, densa CVD SIC coating, caliditas resistentia et resistentia fortis corrosio. Investigatio in nobis est grata.

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Certum esse potes emere SiC susceptorem efficiens ex officina nostra.

Ut CVD SiC fabricans opificem, Semiconductor VeTek velis tibi praebere Susceptores SiC Coating receptores qui graphite et SiC susceptor efficiunt altae puritatis (infra 5ppm). Grata ad nos quaerendum.

Apud Vetek Semiconductorem Lorem in investigationis technologiae, progressionis, et fabricationis, offerentes productorum amplitudines pro industria. Nostrum principale productum linea includit CVD SiC coating+altum puritatis graphitum, SiC susceptorem vestiens, vicus semiconductor, CVD TaC vestiens+ graphitas alta puritas, rigida sentientia, aliaque materia.

One of our producta praetoria producta est Susceptor Coating SiC, evoluta cum technologia ad restrictius requisita epitaxialis lagani productionis. Laganae epitaxiales debent exhibere strictam distributionem necem et defectus superficiei humiles gradus, efficiens nostram tunicam susceptorem SiC elementum essentiale in assequendis parametris crucialibus.


commoda nostra SiC Coating Susceptor:

Base Material Protection: CVD SiC efficiens sicut iacuit tutelae in processu epitaxiali agit, efficaciter protegens materiam basim ab exesa et damno exteriori ambitu. Huius tutelae mensura multum extendit vitae servitutis instrumento.

Praeclara Conductivity Thermal: Nostra CVD SiC coatingis scelerisque conductivity praestantes possidet, efficienter calorem a materia basi ad superficiem coating transferens. Hoc auget scelerisque procuratio efficientiam in epitaxy, procurans optimas temperaturas operandi pro instrumento.

Melior pellicula Qualitas: CVD SiC efficiens superficies plana et aequabilis praebet, fundamentum idealem cinematographicum creat. Reducit defectus e misparis cancelli oriundis, crystallinitatem et qualitatem cinematographici epitaxialis auget, ac tandem suam observantiam et constantiam amplificat.

Elige nostrum SiC Coating Susceptor pro lagano epitaxiali productione necessariorum, et beneficium ex aucta protectione, superior scelerisque conductivity, et amplio amet qualitate. Fiducia in VeTek solutionis semiconductoris porttitor ut effectum tuum in industria semiconductoris pellat.


Basicae physicae proprietates CVD SiC efficiens:

Basicae physicae proprietates CVD SiC coating
Property Typical Value
Crystal Structure FCC β Phase polycrystallina, maxime (111) ordinatur
Density 3.21 g/cm³
duritia MMD Vickers duritiem 500g onus
Frumenti amplitudo 2~10μm
Puritas chemica 99.99995%
Calor Capacity 640 J·kg-1·K-1
Sublimatio Temperature 2700℃
Flexurae Fortitudo 415 MPa RT 4-punctum
Modulus 430 Gpa 4pt bend, 1300℃
Scelerisque conductivity 300W·m-1·K-1
Scelerisque Expansion (CTE) 4.5×10-6K-1


Tabernae productio:


Overview of the semiconductor chip epitaxy industry catena:


Hot Tags: SiC Coating Susceptor, Sina, Manufacturer, Supplier, Factory, Lorem, Eme, Provecta, Dura, Factus in Sinis
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